发明名称 |
Ferroelectric memory and manufacturing method thereof |
摘要 |
A ferroelectric memory includes first and second plugs respectively connected to one and the other of source/drain regions of the transistor formed on a semiconductor wafer. A first capacitor electrode is connected to the first plug and located at a position above the transistor. The first capacitor electrode includes first and second capacitor faces on the second plug side and a side reverse thereto, respectively. A ferroelectric film is disposed on the first capacitor face. A second capacitor electrode is connected to the second plug and located at a position above the transistor. The second capacitor electrode is disposed on the first capacitor face through the ferroelectric film.
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申请公布号 |
US2002066914(A1) |
申请公布日期 |
2002.06.06 |
申请号 |
US20010984518 |
申请日期 |
2001.10.30 |
申请人 |
IMAI KEITARO;YAMAKAWA KOJI |
发明人 |
IMAI KEITARO;YAMAKAWA KOJI |
分类号 |
H01L27/105;H01L21/02;H01L21/8246;H01L27/115;H01L29/76;H01L29/94;(IPC1-7):H01L29/94 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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