发明名称 Ferroelectric memory and manufacturing method thereof
摘要 A ferroelectric memory includes first and second plugs respectively connected to one and the other of source/drain regions of the transistor formed on a semiconductor wafer. A first capacitor electrode is connected to the first plug and located at a position above the transistor. The first capacitor electrode includes first and second capacitor faces on the second plug side and a side reverse thereto, respectively. A ferroelectric film is disposed on the first capacitor face. A second capacitor electrode is connected to the second plug and located at a position above the transistor. The second capacitor electrode is disposed on the first capacitor face through the ferroelectric film.
申请公布号 US2002066914(A1) 申请公布日期 2002.06.06
申请号 US20010984518 申请日期 2001.10.30
申请人 IMAI KEITARO;YAMAKAWA KOJI 发明人 IMAI KEITARO;YAMAKAWA KOJI
分类号 H01L27/105;H01L21/02;H01L21/8246;H01L27/115;H01L29/76;H01L29/94;(IPC1-7):H01L29/94 主分类号 H01L27/105
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