Wasserlösliche Photoresistzusammensetzung

摘要

A water-soluble photoresist composition is provided which comprises a water-soluble photosensitive composition containing casein and a water-soluble photosensitive agent and at least one kind of calcium salt of organic acid. The composition has excellent sensitivity, resolution, and etching resistance and can be used for the production of highly refined electronic components such as shadow masks, lead frame, etc.