发明名称 Photosensitive diacrylate and dimethacrylate compositions
摘要 Compounds of formulae (Ia) and (Ib) wherein the substituents R1 are each independently of the other hydrogen or methyl, R2 is an unsubstituted C1-C20alkyl group or a C1-C20alkyl group which is substituted by one or more than one substituent selected from the group consisting of hydroxy, C6-C14aryl and halogen, an unsubstituted phenyl group or a phenyl group which is substituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, hydroxy or halogen, or is a radical of formula -CH2-OR3, wherein R3 is an unsubstituted C1-C20alkyl group or a C1-C20alkyl group which is substituted by one or more than one substituent selected from the group consisting of hydroxy, C6-C14aryl and halogen, an unsubstituted phenyl group or a phenyl group which is substituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, hydroxy and halogen, or is a C2-C6alkenyl group, a C2-C20acyl group or an unsubstituted cyclohexylcarbonyl group or a cyclohexylcarbonyl group which is substituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, hydroxy and halogen, Z is a group of formulae (IIa)-(IIe) wherein Y is a direct bond, C1-C6alkylene, -S-, -O-, -SO-, -SO2- or -CO-, and R1 is hydrogen or methyl, and wherein the aromatic and cycloaliphatic rings of formulae (IIa)-(IIe) are unsubstituted or substituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, chloro and bromo, form, in conjunction with other acrylates or methacrylates, low viscosity photocurable compositions which, when fully cured, give moulded articles of excellent flexibility.
申请公布号 US2002068801(A1) 申请公布日期 2002.06.06
申请号 US20010953250 申请日期 2001.09.17
申请人 STEINMANN BETTINA;SCHULTHESS ADRIAN;HUNZIKER MAX 发明人 STEINMANN BETTINA;SCHULTHESS ADRIAN;HUNZIKER MAX
分类号 C07B61/00;C07C69/54;C08F2/48;C08F20/30;G03C1/73;G03F7/027;(IPC1-7):C08G59/16 主分类号 C07B61/00
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