发明名称 |
Reference plate, exposure apparatus, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
摘要 |
A reference plate for irradiating a reference mark pattern with observation light, detecting the reflected light, and obtaining the position of the reference mark pattern has a position where the reference mark pattern is not directly exposed to the observation light.
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申请公布号 |
US2002067473(A1) |
申请公布日期 |
2002.06.06 |
申请号 |
US20010881804 |
申请日期 |
2001.06.18 |
申请人 |
DEGUCHI NOBUYOSHI;MORI TETSUYA |
发明人 |
DEGUCHI NOBUYOSHI;MORI TETSUYA |
分类号 |
G01B11/00;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/42 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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