发明名称 Correcting method of mask and mask manufactured by said method
摘要 According to a first aspect of the present invention, there is provided a method of correcting a mask for a data program of a read only memory, comprising selecting an optional data from a data map comprising first data and second data, the optional data being one of the first data, and inspecting neighboring data around the optional data and, where all the neighboring data surrounding the optional data are the second data, correcting a shape of the mask in a position corresponding to the optional data.
申请公布号 US2002069398(A1) 申请公布日期 2002.06.06
申请号 US20010045193 申请日期 2001.10.18
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 IWASE TAIRA
分类号 G03F1/08;G03F1/36;G03F1/68;G11C29/08;H01L21/027;H01L27/112;(IPC1-7):G11C29/00;G06F17/50 主分类号 G03F1/08
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