发明名称 ANTIREFLECTIVE LAYER FOR USE IN MICROLITHOGRAPHY
摘要 <p>An element having a support, and at least an antireflective layer; wherein the antireflective layer is prepared from a composition having a polymer selected from the group consisting of (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure:-C(Rf)(Rf')OHwherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro-2,2-dimethyl-1,3-dioxole or CX2=CY2, where X is -F, or -CF3 and Y is H, or amorphous vinyl copolymers of perfluoro-2,2-dimethyl-1,3-dioxole and CX2=CY2; (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and mixtures thereof.</p>
申请公布号 WO2002044816(A2) 申请公布日期 2002.06.06
申请号 US2001043437 申请日期 2001.11.21
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