发明名称 Blank for an optical lens of quartz glass for a microlithographic device using laser radiation as well as vessel and method of producing the same
摘要 <p>An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank. In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings. <IMAGE></p>
申请公布号 EP1211226(A2) 申请公布日期 2002.06.05
申请号 EP20010128615 申请日期 2001.11.30
申请人 HERAEUS QUARZGLAS GMBH & CO. KG;SHIN-ETSU QUARTZ PRODUCTS CO., LTD. 发明人 UEDA, TETSUJI;FUJINOKI, AKIRA;NISHIMURA, HIROYUKI;TROMMER, MARTIN;OCHS, STEFAN
分类号 C03B19/14;C03B32/00;C03C23/00;(IPC1-7):C03B19/14 主分类号 C03B19/14
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