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发明名称
PROCESSO DI FABBRICAZIONE DI UN DISPOSITIVO ELETTRONICO A SEMICONDUTTORE CON MIGLIORATO ISOLAMENTO TRAMITE AIR GAP.
摘要
申请公布号
ITTO20001134(A1)
申请公布日期
2002.06.05
申请号
IT2000TO01134
申请日期
2000.12.05
申请人
STMICROELECTRONICS S.R.L.
发明人
VASSALLI OMAR;GULLOTTA MASSIMILIANO
分类号
H01L21/3105;H01L21/768
主分类号
H01L21/3105
代理机构
代理人
主权项
地址
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