Non-corrosive cleaning composition for removing plasma etching residues

摘要

A cleaning composition for removing plasma etching residues comprising water, at least one quaternary ammonium hydroxide selected from the group consisting of tetra-alkyl ammonium hydroxide, wherein the alkyl groups are independently selected from methyl, ethyl, propyl and butyl, and a corrosion inhibitor which is tetramethyl ammonium silicate.