发明名称 SUBSTRATE SELECTOR
摘要 <p>Substrate-selecting equipment selects substrates used for objective products from among a group of substrates with photosensitive material layers used for the production of photomask. The substrate-selecting equipment comprises one or more of the defect registering part(s) for registering the results of the inspection of defects of substrates with photosensitive material layers in database, the photosensitive material layer lot check result registering part for registering the results of check of lots of photosensitive material layers in database and the substrate-selecting part for selecting substrates used for the production of objective products from among a group of substrates with photosensitive material layers, on the basis of the results of inspection of defects and the results of check of lots of photosensitive materials registered in database. <IMAGE></p>
申请公布号 EP1211558(A1) 申请公布日期 2002.06.05
申请号 EP20010934361 申请日期 2001.05.28
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 ISHIDA, KOUJI;YAMAZAKI, KIYOSHI;NARA, HIDEYUKI;SEINO, HAJIME
分类号 G03F1/84;G03F1/68;G05B19/418;H01L21/027;(IPC1-7):G03F1/08 主分类号 G03F1/84
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