发明名称 Discharge processing device and method
摘要 <p>Charge accumulated in a capacitor (2) is used to allow a processing current (Ipw) to flow between a target (W) and an electrode (P). When a diode (6) is turned on, a first dc power supply (3) is used to allow the processing current (Ipw) to flow between the target (W) and the electrode (P). In this state, after a lapse of a predetermined time, the current supply using the first dc power supply (3) is stopped, and an induced electromotive voltage, induced by two floating reactors (L 1 , L 2 ), is used to rapidly drop the processing current (Ipw) flowing between the target (W) and the electrode (P), while charging the capacitor (2).</p>
申请公布号 EP1211008(A2) 申请公布日期 2002.06.05
申请号 EP20010112139 申请日期 2001.05.17
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 HASHIMOTO, TAKASHI;SUZUKI, AKIHIRO;TAMIDA, TAICHIROU;IWATA, AKIHIKO;TSUNODA, YOSHIKAZU;OOGURO, HIROYUKI;UKAI, YOSHIKAZU
分类号 B23H1/02;(IPC1-7):B23H1/02 主分类号 B23H1/02
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