发明名称 Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof
摘要 <p>Organic anti-reflective polymer is a specified compound and is useful for fabricating ultrafine patterns of 64M, 256M, 1G, and 4G DRAM semiconductor devices. Organic anti-reflective polymer is a compound of formula (I): R, R' and R'' : hydrogen or methyl; Ra - Rd, and R 1 - R 1 8-H, -OH, -OCOCH 3, -COOH, -CH 2OH, or substituted or unsubstituted, or straight or branched alkyl or alkoxy alkyl having 1 - 5 C; m and n : an integer selected from 1, 2, 3, 4 and 5; x, y, and z : mole fraction from 0.01 - 0.99. Independent claims are also included for: (1) An anti-reflective coating composition comprising a compound (I) and a compound of formula (II); and (1) A method for preparing an anti-reflective coating by (i) dissolving compound (I) and compound (II) in an organic solvent; (ii) filtering the obtained solution alone or in combination with an anthracene derivative; (iii) coating the filtrate on a lower layer; and (iv) hard-baking the coated layer. R 1 9 - R 2 0straight or branched substituted 1 - 10C alkoxy; and R 2 1hydrogen or methyl.</p>
申请公布号 GB2364316(B) 申请公布日期 2002.06.05
申请号 GB20010015798 申请日期 2001.06.28
申请人 * HYNIX SEMICONDUCTOR INC 发明人 SUNG-EUN * HONG;MIN-HO * JUNG;JAE-CHANG * JUNG;GEUN-SU * LEE;KI-HO * BAIK
分类号 G03F7/11;C08F220/18;C08F220/28;C08F220/36;G03F7/004;G03F7/09;H01L21/027;(IPC1-7):C08F220/36 主分类号 G03F7/11
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