| 摘要 |
PURPOSE: To prevent aα-ray soft error of a semiconductor device wherein a solder bump is connected to a Cu wiring formed on an Al wiring. CONSTITUTION: A bump-land 6 connecting with the solder bump 10A and the Cu wiring 10 formed together with it in one-piece, consists of a stacked-layer film of a Cu film and a Ni film formed on its upper portion. The film thickness of the stacked-layer film is larger than film thickness of each of a photosensitive polyimide resin film 11 formed on the lower layers of the Cu wiring 10 and the bump-land 10A, an inorganic passivation film 26, a third Al wiring 25, the bump-pad BP, and a second inter-layer insulating film 24. That is, the bump-land 10A is constructed by film thickness larger than those of an insulating component and wiring component which are interposed between a MISFET (n- channel-type MISFETQn and p-channel-type MISFETQp) and the bump-land 10A. |
