发明名称 |
Semiconductor device fabrication system |
摘要 |
A semiconductor device fabrication system for carrying out a UV-bake on a photoresist pattern in the semiconductor device pattern formation, includes a photoresist coating unit coating a wafer with a specific photoresist; a developing unit forming a photoresist pattern on the wafer coated with the photoresist; and a cross-linking and flow baking unit for cross-linking the photoresist pattern and subsequently flow baking the cross-linked photoresist pattern, wherein the cross-linking and flow baking unit thermally stabilizes the photoresist pattern prior to flow baking.
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申请公布号 |
US6398430(B1) |
申请公布日期 |
2002.06.04 |
申请号 |
US20000634999 |
申请日期 |
2000.08.08 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JEOUNG GYU-CHAN;CHOI KWANG-SEOK;JUNG JIN-HANG;KIM YOUNG-SUN;LEE HONG;CHUNG HOE-SIK;LEE SUNG-HO;HA HUN-HWAN |
分类号 |
G03F7/20;G03F7/40;H01L21/308;(IPC1-7):G03D5/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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