发明名称 |
Semiconductor device having a fuse and a fabrication method thereof |
摘要 |
In a semiconductor device having a fuse and an etching stopper film covering the fuse, an optical window exposing the etching stopper film and a contact hole exposing a conductor pattern are formed simultaneously. By applying a dry etching process further to the etching stopper film, an insulation film covering the fuse is exposed in the optical window. |
申请公布号 |
US6399472(B1) |
申请公布日期 |
2002.06.04 |
申请号 |
US19990319740 |
申请日期 |
1999.06.11 |
申请人 |
FUJITSU LIMITED |
发明人 |
SUZUKI SEIICHI;ADACHI KAZUHIRO;KATAYAMA MASAYA;SUZUKI NORIYUKI;HIDESHIMA OSAMU;KAWABATA KENICHI;OHTSUKI MASAYA;HAYASHI MANABU;YAYANAGI JUNICHI |
分类号 |
H01L21/768;H01L21/8239;H01L21/8242;H01L23/525;(IPC1-7):H01L21/44 |
主分类号 |
H01L21/768 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|