发明名称 Semiconductor device having a fuse and a fabrication method thereof
摘要 In a semiconductor device having a fuse and an etching stopper film covering the fuse, an optical window exposing the etching stopper film and a contact hole exposing a conductor pattern are formed simultaneously. By applying a dry etching process further to the etching stopper film, an insulation film covering the fuse is exposed in the optical window.
申请公布号 US6399472(B1) 申请公布日期 2002.06.04
申请号 US19990319740 申请日期 1999.06.11
申请人 FUJITSU LIMITED 发明人 SUZUKI SEIICHI;ADACHI KAZUHIRO;KATAYAMA MASAYA;SUZUKI NORIYUKI;HIDESHIMA OSAMU;KAWABATA KENICHI;OHTSUKI MASAYA;HAYASHI MANABU;YAYANAGI JUNICHI
分类号 H01L21/768;H01L21/8239;H01L21/8242;H01L23/525;(IPC1-7):H01L21/44 主分类号 H01L21/768
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