| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a copper foil for micro wiring, which has fine surface roughness on a surface to be bonded, is uniformly roughened, has a high etching factor without lowering a bonding strength between the copper foil and a base resin material, and does not leave copper particles on the base material, to form micro wiring. SOLUTION: The method for manufacturing a copper foil for micro wiring comprises; forming a composite metal layer on the surface to be bonded of the copper foil, by electrolyzing it in a plating bath which contains copper ion, ion of metals selected from tungsten or molybdenum, ion of metals selected from nickel, cobalt, iron, or zinc, and chloride ion of 1-100 mg/l, at an electric current density of less than limiting current density of the bath; forming a dendritic copper electrodeposited layer on the composite metal layer, by electrolyzing it in a plating bath containing copper ion, at the electric current density of more than the limiting current density of the bath; and forming coarsened layer consisting of copper, by further electrolyzing it at the current density of less than the limiting current density of the bath to form knotty copper.
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