发明名称 SEMICONDUCTOR MICROACTUATOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor microactuator high in rigidity at a heat insulation part and capable of reducing electric power consumption and its manufacturing method. SOLUTION: Grooves 14a, 14b for implanting polyimide resin 24 at a portion corresponding to the heat insulation parts 4a, 4b (g) to be formed later are formed on a main surface of a supporting base plate 1 by anisotropic etching (b). Then insulation layers 24a2, 24b2 (f) formed by a heat insulation forming process repeating predetermined times a basic process made of series of processes: application of the polyimide resin 24→exposure→development→curing are made to be the heat insulation layers 4a, 4b. The predetermined times are set such that the heat insulation lavers 4a, 4b with a desired thickness are formed.
申请公布号 JP2002160199(A) 申请公布日期 2002.06.04
申请号 JP20000358620 申请日期 2000.11.27
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 KAMAKURA MASAARI;YOSHIDA HITOSHI;YOSHIDA KAZUJI
分类号 B81C1/00;B81B3/00;F16K31/02;F16K31/70;H01L49/00;(IPC1-7):B81C1/00 主分类号 B81C1/00
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