TARGET OF SINTERED BODY FOR MANUFACTURING TRANSPARENT CONDUCTIVE THIN FILM, MANUFACTURING METHOD THEREFOR, AND TRANSPARENT CONDUCTIVE THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a transparent conductive thin film, a sputtering target for manufacturing the transparent conductive thin film by a sputtering method, and a method for manufacturing the sputtering target. SOLUTION: This transparent conductive thin film comprises a film composition which mainly consists of indium oxide and includes tin and rhenium together. The composition comprises that tin content is in a range of 0.029-0.138 by tin/indium atom ratio, and rhenium content is in a range of 0.002-0.015 by rhenium/indium atom ratio. Thereby the transparent conductive thin film realizes lower resistance than that of a conventional indium oxide thin film including tin.