发明名称 Semiconductor device with extra control wiring for improving breakdown voltage
摘要 In a lateral bipolar transistor, a control wiring layer is laid down under an emitter electrode wiring layer, and a voltage according to a reverse bias voltage applied to the collector diffusion layer is applied to the control wiring layer, thereby preventing the occurrence of a leakage current from the emitter diffusion and further the flow of the leakage current to the device isolation region, even under a situation that a certain reverse bias voltage is applied to the collector of the transistor.
申请公布号 US6399999(B2) 申请公布日期 2002.06.04
申请号 US20010760800 申请日期 2001.01.17
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA;MITSUBISHI ELECTRIC ENGINEERING COMPANY LIMITED 发明人 HOASHI MASAHARU
分类号 H01L29/73;H01L21/331;H01L29/417;H01L29/423;H01L29/735;(IPC1-7):H01L27/082 主分类号 H01L29/73
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