| 发明名称 |
Aluminum complex derivatives for chemical vacuum evaporation and the method of producing the same |
| 摘要 |
Organometallic compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organimetallic compounds and methods of forming aluminum films.
|
| 申请公布号 |
US6399772(B1) |
申请公布日期 |
2002.06.04 |
| 申请号 |
US20000596115 |
申请日期 |
2000.06.16 |
| 申请人 |
ROHM AND HAAS COMPANY |
发明人 |
SHIN HYUN-KOOCK;SHIN HYUN-JOO |
| 分类号 |
H01L23/52;C07F5/06;C23C16/20;H01L21/3205;(IPC1-7):C07D207/00;C07D333/46;B05D5/12 |
主分类号 |
H01L23/52 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
