发明名称 PHOTOCURABLE SOLVENTLESS MANICURE
摘要 PROBLEM TO BE SOLVED: To provide a photocurable solventless manicure. SOLUTION: This photocurable solventless manicure is a photocurable composition including a compound having a polymerizable unsaturated group and a photoinitiator, preferably having a Primary Irritation Index(PII) value <=3.
申请公布号 JP2002161025(A) 申请公布日期 2002.06.04
申请号 JP20010191832 申请日期 2001.06.25
申请人 CHEMIPROKASEI KAISHA LTD 发明人 MATSUMURA AKIRA
分类号 A61K8/00;A61Q3/02;(IPC1-7):A61K7/043 主分类号 A61K8/00
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