发明名称 METHOD FOR CLEANING MASK FOR COATING AND EQUIPMENT FOR THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for cleaning masks for coating adhered with coating films which is capable of well cleaning the masks for coating by an aqueous cleaning liquid containing prescribed heated components in place of an organic solvent like trichloroethylene and is capable of recycling the aqueous cleaning liquid after cleaning. SOLUTION: The method for cleaning the masks for coating adhered with the coating films by masked coating and used in masked coating of desired products to be coated is characterized in that the coating films on the surfaces of the masks for coating are peeled away by jetting the heated aqueous cleaning liquid containing sodium polyacrylate, sodium gluconate, sodium phosphate and sodium borate to the masks for coating adhered with the coating films.</p>
申请公布号 JP2002159923(A) 申请公布日期 2002.06.04
申请号 JP20000361281 申请日期 2000.11.28
申请人 HAIPAATEKKU KK 发明人 OGAWA TAKAO;KUBO KOICHI
分类号 B08B3/10;B05B15/04;B05C5/00;B05C9/12;B05C11/10;B05D3/10;B08B3/02;B08B3/08;C09D9/00;C11D7/10;C11D7/16;C11D7/22;C11D7/26;C11D17/08;(IPC1-7):B08B3/10 主分类号 B08B3/10
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