| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma-resistant seal which ahs an excellent oxygen plasma-resistant characteristic. SOLUTION: This plasma-resistant seal is characterized by cross-linking a fluororubber-based composition prepared by adding a crystalline resin to a fluororubber. Therein, inorganic substances are preferable minimized to an amount of <=1 pt.wt. per 100 pts.wt. of the fluororubber. The crystalline resin is especially polyethylene, and a preferable embodiment is that the fluororubber- based composition is cross-linked with an organic peroxide. The plasma-resistant seal is optimal to a seal for a semiconductor-fabricating device.
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