发明名称 |
Test structures for electrical linewidth measurement and processes for their formation |
摘要 |
In a method of determining a linewidth of a polysilicon line formed by a lithographic process, a polysilicon layer is formed on a substrate. A line is patterned from said polysilicon layer using said lithographic process and a Van der Pauw structure is patterned from said polysilicon layer. N2 is then implanted into the polysilicon line and the polysilicon Van der Pauw structure to form a depletion barrier. A P-type dopant is the implanted into the polysilicon line and the polysilicon Van der Pauw structure and the dopant is activated. A sheet resistivity of the Van der Pauw structure is determined, and the linewidth of the polysilicon line is then determined by electrical linewidth measurement using the sheet resistivity of the Van der Pauw structure as the sheet resistivity of the polysilicon line. A related test structure is also disclosed.
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申请公布号 |
US6399401(B1) |
申请公布日期 |
2002.06.04 |
申请号 |
US20010912186 |
申请日期 |
2001.07.24 |
申请人 |
ADVANCED MICRO DEVICES, IN. |
发明人 |
KYE JONGWOOK;LEVINSON HARRY |
分类号 |
H01L23/544;(IPC1-7):G01R31/26 |
主分类号 |
H01L23/544 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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