| 摘要 |
The present invention relates to a method for creating a pattern on a workpiece with better pattern fidelity and dimensional precision. The method comprises the steps of: providing a source for emitting electromagnetic radiation, illuminating by said radiation a spatial light modulator (SLM) having a multitude of pixels, projecting an image of the modulator on the workpiece, moving said workpiece and/or projection system relative to each other, reading from an information storage device a digital description of the pattern to be written, extracting from the pattern description a sequence of partial patterns, converting said partial patterns to modulator signals, and feeding said signals to the modulator, further coordinating the workpiece, the modulator and the radiation source, so that said pattern is stitched together from the partial images, further exposing said pattern in at least two separate exposures, where at one exposure corrections are applied for errors occurring during another exposure.
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