发明名称 |
ROTARY SUBSTRATE PROCESSING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a rotary substrate processing apparatus, in which the generation of spot or stain on a substrate is prevented by straightening the flow of a gas generated around the substrate and a substrate supporting table toward the outside to prevent it from blowing-up to the substrate surface. SOLUTION: The rotary substrate processing apparatus is provided with a rotary shaft 3, a substrate supporting table 2 on which a substrate 1 is placed and which rotates horizontally around the axial center 30 of the rotary shaft 3, a cup 5 positioned so that the opening edge 55 at the upper side is projected from its cylindrical side face part 51 toward the inside to recover a processing liquid supplied to the substrate 1 placed on the substrate supporting table 2 and a flow straightening plate 6 provided extendedly toward the down side on the inside surface between the opening edge 55 and the side face part 51, and plural flow straightening plates 6 are provided to divide the opening edge 55 at prescribed intervals and each is inclined to the rotary direction downstream side at a prescribed angle θ to a line D from a division point P toward the outside diameter direction. |
申请公布号 |
JP2002159904(A) |
申请公布日期 |
2002.06.04 |
申请号 |
JP20000358832 |
申请日期 |
2000.11.27 |
申请人 |
SUMITOMO PRECISION PROD CO LTD |
发明人 |
MURATA TAKASHI;NAKADA KATSUTOSHI |
分类号 |
G03F7/16;B05C11/08;B05D1/40;B05D7/00;G03F7/30;H01L21/027;H01L21/304 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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