发明名称 ROTARY SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a rotary substrate processing apparatus, in which the generation of spot or stain on a substrate is prevented by straightening the flow of a gas generated around the substrate and a substrate supporting table toward the outside to prevent it from blowing-up to the substrate surface. SOLUTION: The rotary substrate processing apparatus is provided with a rotary shaft 3, a substrate supporting table 2 on which a substrate 1 is placed and which rotates horizontally around the axial center 30 of the rotary shaft 3, a cup 5 positioned so that the opening edge 55 at the upper side is projected from its cylindrical side face part 51 toward the inside to recover a processing liquid supplied to the substrate 1 placed on the substrate supporting table 2 and a flow straightening plate 6 provided extendedly toward the down side on the inside surface between the opening edge 55 and the side face part 51, and plural flow straightening plates 6 are provided to divide the opening edge 55 at prescribed intervals and each is inclined to the rotary direction downstream side at a prescribed angle θ to a line D from a division point P toward the outside diameter direction.
申请公布号 JP2002159904(A) 申请公布日期 2002.06.04
申请号 JP20000358832 申请日期 2000.11.27
申请人 SUMITOMO PRECISION PROD CO LTD 发明人 MURATA TAKASHI;NAKADA KATSUTOSHI
分类号 G03F7/16;B05C11/08;B05D1/40;B05D7/00;G03F7/30;H01L21/027;H01L21/304 主分类号 G03F7/16
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