| 摘要 |
PROBLEM TO BE SOLVED: To form a metal oxide film on an object to be film formed without placing the object in an inert gas atmosphere. SOLUTION: This apparatus includes irradiating a substrate 22 which is accommodated in a film forming chamber 20 kept in vacuum, with metal ion from a metal ion source 36, and then irradiating the substrate 20 with oxide ion from an oxide ion source 30, to form the metal oxide film on the substrate 22.
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