| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing liquid supply mechanism, in which liquid leakage at the time of stopping the supply of a processing liquid is surely prevented by reducing a time required to dry a substrate. SOLUTION: At the time of stopping the discharge of the processing liquid from a state in which the processing liquid is discharged from a nozzle 3, discharge values 7 and 8 in the opened state are closed successively in the order from the 2nd discharge valve 8 to the 1st discharge valve 7 by a controller 9. Concretely, the controller 9 outputs a closing signal to the 1st discharge valve 7 after a prescribed time (e.g. after 1-2.0 sec) elapses from a time when the closing signal is outputted to the 2nd discharge valve 8. As a result, the stream of the processing liquid in a processing liquid supply pipe 5 is cut-off to stop the discharge of the processing liquid from the nozzle 3. |
