发明名称 PRODUCTION MANAGEMENT SYSTEM FOR FILM FORMED SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide a production management system for film formed substrates, which can perform 100% inspection of thin films on the film formed substrates without lowering equipment throughput, and which can rapidly revise an operation of a film forming method. SOLUTION: The production management system comprises a sputtering device 34 for forming a metal thin film 12a on a glass substrate 12, a sheet- resistance measuring means for calculating a sheet resistance by irradiating the substrate with a magnetic flux of a magnetic field from one side of the metal thin film 12a, a computer 26 for control and operation, which judges a film forming process as good or bad, based on a comparison between the calculated sheet resistance and a reference value, cell computers 33 and 33a for managing a manufacturing process of the film formed substrate, and a host computer 32 for managing the whole manufacturing process of the film formed substrate by controlling the cell computers 33 and 33a. The host computer 32 comprises sending a signal for controlling operation to the sputtering device 34 through the cell computer 33, based on the judgment result by the computer 26 for control and operation.</p>
申请公布号 JP2002161366(A) 申请公布日期 2002.06.04
申请号 JP20000351703 申请日期 2000.11.17
申请人 SHARP CORP 发明人 HARADA YOSHINORI
分类号 G05B19/418;C23C14/54;H01L21/02;(IPC1-7):C23C14/54 主分类号 G05B19/418
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