发明名称 SPUTTERING APPARATUS
摘要 PURPOSE: A sputtering apparatus is provided to automatically control a pressure of a gas injection/exhaust pipe by using an electromotive valve. CONSTITUTION: A sputtering apparatus comprises a chamber(10) performing a sputtering, a gas injection/exhaust pipe(32) injecting a gas to the chamber(10), a first valve(26) injecting the gas to the gas injection/exhaust pipe(32), a second valve(24) exhausting the gas from the chamber(10) to the injection/exhaust pipe(32), an electromotive valve(40) for controlling the pressure of the gas injection/exhaust pipe(32) connected between the chamber(10) and the gas injection/exhaust pipe(32), and a controller(42) controlling the chamber(10), the first valve(26), the second valve(24) and the electromotive valve(40). By using the electromotive valve(40), the pressure of the gas injection/exhaust pipe(32) is automatically controlled.
申请公布号 KR20020041167(A) 申请公布日期 2002.06.01
申请号 KR20000070950 申请日期 2000.11.27
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JANG, HYEON BOK
分类号 H01L21/203;(IPC1-7):H01L21/203 主分类号 H01L21/203
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