| 摘要 |
PURPOSE: To provide an aligner and a method for manufacturing a device using it, wherein high resolution is obtained at all times, even if a pattern on a reticule surface is illuminated in various lighting modes. CONSTITUTION: A lighting optical system for lighting a reticule 14 where a pattern is formed, a projection optical system 16 for projecting a pattern on a substrate, and a measuring means for measuring angle distribution of illuminating light incident on the projection optical system 16 are provide, and by moving a part of optical member of the lighting optical system in the direction of optical axis, based on the measuring result of the measuring means, the angle distribution of illuminating light incident on the projection optical system 16 is changed with multiplying factor with the optical axis as center.
|
