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发明名称
METHODOLOGIES TO REDUCE PROCESS SENSITIVITY TO THE CHAMBER WALL CONDITION
摘要
申请公布号
KR20020041405(A)
申请公布日期
2002.06.01
申请号
KR1020027000438
申请日期
2002.01.11
申请人
发明人
分类号
H01L21/3065
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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