The invention relates to high purity fluoropolymers and processes for making such materials. These polymers are particularly suited for applications in the semiconductor industry. The process comprises removal of unstable polymer end groups by fluorination and removal of heavy metal impurities by extraction with an aqueous acid medium.
申请公布号
WO0192351(A3)
申请公布日期
2002.05.30
申请号
WO2001US16902
申请日期
2001.05.23
申请人
3M INNOVATIVE PROPERTIES COMPANY
发明人
BLONG, THOMAS, J.;DUCHESNE, DENIS;LOEHR, GERNOT;KILLICH, ALBERT;ZIPPLIES, TILMAN;KAULBACH, RALPH;STRABER, HERBERT
