| 摘要 |
<p>A method and an apparatus for measuring aberration of a projection optical system with high accuracy. A micro measuring pattern (10a) and a large measuring pattern (10b) on a reticle (9) are irradiated with illumination lights having incoherence. Light flux transmitted the measuring patterns (10a and 10b) further transmit respective projection optical systems (PL) to be measured to form the image of the measuring patterns on a large reference pattern (13a) and a micro reference pattern (13b) on a reference pattern plate (12). Light flux transmitted the reference patterns (13a and 13b) pass through a lens system (15) to form an interference fringe on an imaging element (16). Wave front aberration of the projection optical system is measured from the state of the interference fringe.</p> |
