发明名称 HETEROSTRUCTURE WITH REAR-FACE DONOR DOPING
摘要 The invention relates to a heterostructure with a buffer layer or substrate, a channel arranged on the buffer layer or substrate and a capping layer arranged on the channel. Said channel is made from a piezopolar material and either the region around the boundary interface between the buffer layer or substrate and the channel, or the region around the boundary interface between the channel and the capping layer is doped in such a way that any piezo charging which occurs at the respective boundary interface is compensated.
申请公布号 WO0192428(A3) 申请公布日期 2002.05.30
申请号 WO2001EP06279 申请日期 2001.06.01
申请人 KOHN, ERHARD;DAUMILLER, INGO;KAMP, MARKUS;SEYBOTH, MATTHIAS 发明人 KOHN, ERHARD;DAUMILLER, INGO;KAMP, MARKUS;SEYBOTH, MATTHIAS
分类号 H01L29/812;H01L21/338;H01L27/095;H01L29/20;H01L29/36;H01L29/778 主分类号 H01L29/812
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