发明名称 |
METHOD OF MAKING A FUNCTIONAL DEVICE WITH DEPOSITED LAYERS SUBJECT TO HIGH TEMPERATURE ANNEAL |
摘要 |
A method is disclosed for making a device having one or more deposited layers and subject to a post deposition high temperature anneal. Opposing films having similar mechanical properties are deposited on the front and back faces of a wafer, which is subsequently subjected a high temperature anneal. The opposing films tend to cancel out stress-induced warping of the wafer during the subsequent anneal. |
申请公布号 |
WO0243130(A2) |
申请公布日期 |
2002.05.30 |
申请号 |
WO2001CA01659 |
申请日期 |
2001.11.22 |
申请人 |
ZARLINK SEMICONDUCTOR INC. |
发明人 |
OUELLET, LUC;DALLAIRE, ANNIE |
分类号 |
G02B6/12;G02B6/132 |
主分类号 |
G02B6/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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