发明名称 |
Method of removing residual photoresist |
摘要 |
A method for removing residual color photoresist material from a substrate after photoresist development. The method washes the substrate with a high-pressure jet of de-ionized water that contains an activated interface agent. A second method of removing the residual photoresist material bombards the substrate with oxygen plasma for a brief period so that the residual photoresist material is polarized and then rinses the substrate with de-ionized water.
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申请公布号 |
US2002062838(A1) |
申请公布日期 |
2002.05.30 |
申请号 |
US20020053124 |
申请日期 |
2002.01.17 |
申请人 |
KU CHI-FA;CHOU HSIAO-PANG |
发明人 |
KU CHI-FA;CHOU HSIAO-PANG |
分类号 |
G03F7/30;(IPC1-7):B08B3/02 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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