| 摘要 |
Differences between the secondary electron emission characteristics of two phases of the same material in response to bombardment by an electron beam are sensed to enable impurities, comprising one of the material's phases, in a sample, comprising the material's phase, to be detected. The electron beam is a low energy beam. Relative motion between the sample and the beam may be effected by sweeping the beam, by moving the sample, or by a combination of the two motions.
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