| 摘要 |
<p>The invention concerns a method for analysing a substrate (2) surface which consists in providing a reflection image of at least a target (1) on said surface, retrieving by digital processing local phases along two directions. The invention is characterised in that it consists in calculating by digital processing based on the local phases, local slope variations to deduce therefrom curvature variations or altitude variations of said surface.</p> |
