发明名称 SHADOW MASK HAVING THERMAL EXPANSION ABSORBING STRUCTURE
摘要 PURPOSE: A shadow mask having a thermal expansion absorbing structure is provided to suppress landing error of an electron beam by absorbing thermal expansion due to electron beam impact. CONSTITUTION: A shadow mask having a thermal expansion absorbing structure comprises many holes, through-parts(521,531) and half etching parts(523,533). Each of the many holes has a through-hole(511) from the top to the bottom of the shadow mask and a protrusion(512) at the center of the through-hole(511). The through-parts(521,531) are formed at the area where the holes does not exist, and have protrusions(522,532). The half etching parts(523,533) are arranged at the outer boundaries of the through-parts(521,531). The through-parts(521,531) and the half etching parts(523,533) are formed to be spaced from each other at an upper surface and a lower surface. The half etching parts(523,533) are formed as circles, ovals or rectangles.
申请公布号 KR20020039997(A) 申请公布日期 2002.05.30
申请号 KR20000069891 申请日期 2000.11.23
申请人 SAMSUNG SDI CO., LTD. 发明人 LIM, YEONG BIN
分类号 H01J29/07;(IPC1-7):H01J29/07 主分类号 H01J29/07
代理机构 代理人
主权项
地址