发明名称 RECYCLING OF WAFER CLEANING SUBSTANCES
摘要 <p>A method of recycling and purifying cleaning chemicals used in the production of semiconductor circuits and containing hydrofluoric acid and or hydrochloric acid. Recycling of such chemicals is accomplished using separation and reconstitution steps Hydrofluoric acid and hydrochloric acid cannot be distilled directly from a chemical solution as they form azeotropes with water. A low vapor pressure substance such as sulfuric acid or phosphoric acid is used to break the azeotrope while increasing the purity of the recovered chemicals and decreasing disposal problems. The method is useable at the point of use of the chemicals.</p>
申请公布号 EP0739228(B1) 申请公布日期 2002.05.29
申请号 EP19950903515 申请日期 1994.11.14
申请人 FSI INTERNATIONAL 发明人 GRANT, DONALD, C.
分类号 B01D3/36;B01D3/34;C01B7/01;C01B7/07;C01B7/09;C01B7/19;C01B9/04;C01B21/46;H01L21/304;(IPC1-7):B01D3/34;C01B17/90 主分类号 B01D3/36
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