Inductive type plasma processing chamber

摘要

The inductive type plasma processing chamber (10) has two or more windows (22a, 22b) for receiving induced field energy, each window enabling induced field energy to enter the chamber from a respective direction, and further comprises one or more partitions to isolate spaces therein associated with one or a group of windows (22a, 22b). The partitioning may be ensured by a workpiece support structure (38, 40) in conjunction with at least one workpiece (16) and by gas-tight seals at the point of contact between the support structure and the workpiece(s).