| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron-beam exposure system and an electron lens which can respectively converge plural electron beams, independently and with high precision. SOLUTION: This electron-beam exposure system is for exposing a wafer using plural electron beams and equipped, with an electron-beam generation part to generate plural electron beams and an electron lens part for converging respectively plural electron beams independently. The electron-lens part has the first main magnetism conductor part which contains plural first opening parts where the plural electron beams pass, the second main magnetism conductor part, which is arranged nearly in parallel with the first main magnetism conductor part and contains plural second opening parts, where the plural electron beams pass, and plural first subsidiary magnetism conductor part which is arranged protrudingly in a direction nearly parallel in the irradiation direction of the electron beam, in the surroundings of the first opening part at the first main magnetism conductor part.
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