| 摘要 |
PROBLEM TO BE SOLVED: To obtain a projection aligner, capable of accurately projecting a pattern of a reticle, while improving the throughput, and to provide a method for manufacturing a device using the same. SOLUTION: The projection aligner projects the pattern of the reticle illuminated by a laser beam from a continuously oscillating excimer laser, on a base plate by a projection optical system. The projection optical system has a lens system made of a substantially single vitreous material. The excimer laser has a pulse oscillated laser for injecting and synchronizing the pulse beam. |
