发明名称 METHOD OF WASHING SUBSTRATE AND SUBSTRATE CLEANING DEVICE
摘要 PROBLEM TO BE SOLVED: To achieve uniform stable substrate washing along with saving resource and waste reduction. SOLUTION: In a washing step of a substrate using a solution as a cleaning solution including fluorinated ammonium, the concentration of a given component is regularly measured. An element for correcting the density is replenished if necessary based on the measurement result. As an example, when the measured element is HF, and then the measurement result falls below the setting range, the HF element is replenished. When the measurement result exceeds the range of setting, an ammonia element is replenished.
申请公布号 JP2002151457(A) 申请公布日期 2002.05.24
申请号 JP20000341094 申请日期 2000.11.08
申请人 SONY CORP 发明人 INAGAKI YASUSHI
分类号 G02F1/13;B08B3/08;G02F1/1333;H01L21/304;H01L21/308;(IPC1-7):H01L21/304;G02F1/133 主分类号 G02F1/13
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