| 摘要 |
PROBLEM TO BE SOLVED: To provide an in-line wafer carriage system with a small quantity of dust to a wafer from the outside. SOLUTION: A semiconductor wafer W with a device pattern is carried from an etching system 20 to a mounting system 200 in an in-line wafer carriage system 300. The wafer carriage mechanism 300 includes a temporarily mounting stage 301 pivotally supported by a rotation shaft 303, a supporting member 304 of the rotation shaft 303, a rotation driving mechanism 162 for the rotation shaft 303, and driving mechanisms 306, 307, and 308 for reciprocating the supporting member 304 in an orbital path surrounded with a tubular dome chamber 316. The in-line wafer carriage system 300 is stored in a transparent resin-made dome chamber 316. |
