发明名称 MANUFACTURING METHOD AND APPARATUS OF SEMICONDUCTOR LIGHT EMITTING DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain a semiconductor light emitting device having high emission efficiency by a simple method. SOLUTION: In the manufacturing method and apparatus of a semiconductor light emitting device, the intensity of scattered light on a growth crystal surface is measured for detecting the roughness on the crystal surface to set crystal growth conditions when performing the crystal growth of a semiconductor on a substrate by the MBE method.
申请公布号 JP2002151793(A) 申请公布日期 2002.05.24
申请号 JP20000339256 申请日期 2000.11.07
申请人 SHARP CORP 发明人 SUGA YASUO
分类号 H01S5/323;(IPC1-7):H01S5/323 主分类号 H01S5/323
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