发明名称 THIN-FILM TRANSISTOR AND LIQUID-CRYSTALLINE DISPLAY DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To improve the characteristics of a polycrystalline silicon thin-film transistor. SOLUTION: The internal stress of a gate insulating film is set at -100 to 500 Mpa. Thus, the interface defect with a polycrystalline silicon, which is a semiconductor layer, is reduced, and a thin-film transistor with improved on-characteristics is provided.</p>
申请公布号 JP2002151701(A) 申请公布日期 2002.05.24
申请号 JP20000348215 申请日期 2000.11.15
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SANO HIROSHI;SAKAI MASAHIRO;KOBAYASHI IKUNORI;TAMURA TATSUHIKO
分类号 G02F1/136;G02F1/1368;H01L21/316;H01L29/786;(IPC1-7):H01L29/786 主分类号 G02F1/136
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