发明名称 SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent outdoor air or external contaminants from intruding into a reaction pipe from a water discharge pipe for discharging water generated by reaction in a pyrogenic furnace. SOLUTION: This device is provided with a gas discharge port 3 connected to the reaction pipe 1, a discharge pipe 4 connected to the gas discharge port for discharging gas, and the water discharge pipe 5 connected to the gas discharge port for discharging the water generated by the reaction. Also, the water discharge pipe is provided with a part lower than a downstream side on an upstream side.
申请公布号 JP2002151498(A) 申请公布日期 2002.05.24
申请号 JP20010337741 申请日期 2001.11.02
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 YAMAUCHI KAZUHIRO
分类号 H01L21/31;(IPC1-7):H01L21/31 主分类号 H01L21/31
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