MULTIPLE FREQUENCY PLASMA CHAMBER WITH GROUNDING CAPACITOR AT CATHODE

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a method for manufacturing an electronic workpiece in which first and second electrodes within a plasma chamber are respectively connected to low frequency and high frequency RF power supplies. SOLUTION: At least one of capacitors 50-54 is connected between the first electrode and electrical ground. The one or more capacitors can reduce or eliminate the coupling of high frequency RF output to any plasma outside the region directly between the two electrodes 12 and 20. Consequently, the chamber can improve plasma processing performance by concentrating more of the RF output in the region between the two electrodes.